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Title:
ELECTRON GUN
Document Type and Number:
WIPO Patent Application WO/2010/134259
Kind Code:
A1
Abstract:
Provided is a cold cathode field emission electron gun with a low aberration, and thereby provided is an electron gun with a high brightness even at large current. In the field emission electron gun that extracts an electron beam from a cathode and converges the extracted electron beam, a magnetic field lens is provided so that the cathode is disposed in the lens magnetic field, and an extraction electrode for extracting electrons from the cathode is formed in a cylindrical shape without an aperture structure. An electrostatic lens effect can be reduced that incidentally occurs in an electron gun having a function of converging an electron beam by use of a magnetic field, thereby providing an electron gun with a small aberration and a high brightness.

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Inventors:
ICHIHASHI MIKIO (JP)
ONISHI TAKASHI (JP)
WATANABE SHUNICHI (JP)
TAMURA KEIJI (JP)
Application Number:
PCT/JP2010/002684
Publication Date:
November 25, 2010
Filing Date:
April 14, 2010
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
ICHIHASHI MIKIO (JP)
ONISHI TAKASHI (JP)
WATANABE SHUNICHI (JP)
TAMURA KEIJI (JP)
International Classes:
H01J37/073
Domestic Patent References:
WO2005124815A12005-12-29
Foreign References:
JP2006324119A2006-11-30
JP2008311174A2008-12-25
JP2009087593A2009-04-23
JP2008140623A2008-06-19
Attorney, Agent or Firm:
INOUE, MANABU (JP)
Manabu Inoue (JP)
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Claims:



 
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