Title:
GRINDING DISK AND SUBSTRATE CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/024190
Kind Code:
A1
Abstract:
Provided in the present application are a grinding disk and a substrate cleaning device. The grinding disk comprises a thickness self-adaptive layer, and a base layer and a grinding sheet which are fixed to two opposite surfaces of the thickness self-adaptive layer, wherein the base layer is connected to a grinding head, and the grinding sheet is in contact with a product so as to grind and clean the product. The thickness self-adaptive layer is deformable on the basis of the pressure applied to a product to be cleaned by the grinding disk, such that the grinding disk can be in full contact with the surface of the product to be cleaned, and therefore the cleaning area of the grinding disk can reach 100%, and the cleaning yield of the product can be improved.
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Inventors:
MA ZEHAO (CN)
SHEN HAIYANG (CN)
SHEN HAIYANG (CN)
Application Number:
PCT/CN2021/118207
Publication Date:
March 02, 2023
Filing Date:
September 14, 2021
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
B24B37/11; B24B27/033; B24B37/12; B24B37/14
Foreign References:
| CN111941155A | 2020-11-17 | |||
| JP2008290207A | 2008-12-04 | |||
| CN208528802U | 2019-02-22 | |||
| CN1482958A | 2004-03-17 | |||
| CN108161711A | 2018-06-15 |
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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