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Title:
MASK UNIT AND DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/010284
Kind Code:
A1
Abstract:
A mask unit (1) is configured such that, in a planar view, the total opening lengths of apertures (S) that are not covered by a beam part (22) in the Y-direction are equal at any position in the X-direction in the apertures (S) of a deposition mask (10). The portion of the beam part (22) that is in contact with the deposition mask (10) does not span a frame unit (21) along the Y-direction, and transverses the Y-direction in a continuous or intermittent manner.

Inventors:
OCHI TAKASHI
KAWATO SHINICHI
OSAKI TOMOFUMI
NIBOSHI MANABU
KOSAKA TOMOHIRO
TSUKAMOTO YUTO
KIKUCHI KATSUHIRO
Application Number:
PCT/JP2013/061201
Publication Date:
January 16, 2014
Filing Date:
April 15, 2013
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
C23C14/04; C23C14/24; H01L51/50; H05B33/10
Foreign References:
JP2004043877A2004-02-12
JPH09320758A1997-12-12
JP2006294280A2006-10-26
JP2006233286A2006-09-07
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
Patent business corporation Hara [Kenzo] international patent firm (JP)
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