Title:
METHOD OF FORMING FILM WITH USE OF CVD APPARATUS AND MASK FOR MASKING
Document Type and Number:
WIPO Patent Application WO/2007/055030
Kind Code:
A1
Abstract:
A method of forming a film, comprising partially masking a surface of substance
(111) and carrying out a film formation at exposed area (S1) of the surface with
the use of parallel flat plate type plasma CVD apparatus (300), wherein as a member
for masking, use is made of platy mask (71,71b,71c,71d,77,77b) furnished with
projection (715,716,775) capable of inducing discharge on the side toward plasma
generation space. By virtue of the furnishing of the projection, the occurrence
of abnormal discharge at mask edges is minimized, reducing any local increase
of film thickness in the vicinity of the mask.
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Inventors:
NANTO TOSHIYUKI (JP)
Application Number:
PCT/JP2005/020866
Publication Date:
May 18, 2007
Filing Date:
November 14, 2005
Export Citation:
Assignee:
FUJITSU HITACHI PLASMA DISPLAY (JP)
NANTO TOSHIYUKI (JP)
NANTO TOSHIYUKI (JP)
International Classes:
C23C16/44; H01J9/02; H01J11/02
Foreign References:
| JP2000017422A | 2000-01-18 | |||
| US3951701A | 1976-04-20 | |||
| JP2003324075A | 2003-11-14 | |||
| JP2000021304A | 2000-01-21 |
Attorney, Agent or Firm:
KUBO, Yukio (1-26 Nishinakajima 7-chome, Yodogawa-k, Osaka-shi Osaka 11, JP)
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