METHOD FOR MANUFACTURING DISPLAY

WIPO Patent Application WO/2004/070819

A1

A method for manufacturing a display at lower cost by using a means for locally forming a resist film and a means for locally conducting film-formation, etching or ashing through plasma processing under atmospheric pressure or pressures around atmospheric pressure is disclosed. The method for manufacturing a display is characterized by comprising a step wherein a conductive film is locally formed under atmospheric pressure or pressures around atmospheric pressure, thereby forming wiring. In this connection, the wiring can be any kind of wiring such as wiring serving as gate wiring or source wiring in a pixel portion of active matrix displays, connection wiring for sending a signal from an external input terminal to the pixel portion, and wiring for connecting a thin-film transistor (TFT) with a pixel electrode.

JP2003335740	TANTALUM COMPLEX AND SOLUTION RAW MATERIAL CONTAINING THE COMPLEX AND USED FOR ORGANIC METAL CHEMICAL VAPOR DEPOSITION METHOD AND TANTALUM-CONTAINING THIN FILM FORMED FROM THE SAME
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JP2520990	[Title of Invention] A method for manufacturing a low-defect polysilicon integrated circuit

YAMAZAKI SHUNPEI (JP)

PCT/JP2004/000895

August 19, 2004

January 30, 2004

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SEMICONDUCTOR ENERGY LAB (JP)
YAMAZAKI SHUNPEI (JP)

H01L21/285; H01L21/336; H01L21/768; H01L29/786; H01L51/00; H01L51/40; G02F1/1362; (IPC1-7): H01L21/3213; H01L21/285; H01L21/28; H01L21/336; H01L21/3065; B05D3/04; H05K3/10; G09F9/30

JP2002237480A	2002-08-23
JP2002237463A	2002-08-23
JP2001068827A	2001-03-16
JPH11340129A	1999-12-10
JP2002151478A	2002-05-24
JP2002289864A	2002-10-04

See also references of EP 1592052A4

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