Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
OXIDE-SINTERED-BODY SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2017/110909
Kind Code:
A1
Abstract:
An oxide-sintered-body sputtering target according to an embodiment of the present invention is formed of a sintered body containing an indium oxide, a zinc oxide, a titanium oxide, and a zirconium oxide, wherein the atomic ratio of titanium with respect to the sum of the amounts of indium, zinc, and titanium is 0.1-20 %, and the specific weight of zirconium with respect to the sum of indium oxide, zinc oxide, titanium oxide, and zirconium oxide is 10-2000 ppm.

Inventors:
TAKAHASHI KAZUTOSHI (JP)
HIDAKA KOJI (JP)
KAWAGOE YUU (JP)
TAKESUE KENTAROU (JP)
WADA MASARU (JP)
UENO MITSURU (JP)
KIYOTA JUNYA (JP)
KOBAYASHI MOTOSHI (JP)
TAKEI MASAKI (JP)
Application Number:
PCT/JP2016/088182
Publication Date:
June 29, 2017
Filing Date:
December 21, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ULVAC INC (JP)
International Classes:
C23C14/34; C04B35/01
Domestic Patent References:
WO2015059938A12015-04-30
WO2012077512A12012-06-14
Foreign References:
JPH11256321A1999-09-21
JP2006206384A2006-08-10
Attorney, Agent or Firm:
OMORI, Junichi (JP)
Download PDF:



 
Previous Patent: ELECTRONIC EYEGLASSES

Next Patent: STEEL COMPONENT