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Title:
PHASE SHIFT MASK, ARRAY SUBSTRATE, FABRICATION METHOD THEREOF AND DISPLAY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/153804
Kind Code:
A1
Abstract:
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion (02) on the substrate (01). The wiring light shielding portion (02) includes a light shielding region (021) and a phase shift region (022). In a direction perpendicular to the extending direction of the wiring light shielding portion (02) a width of the light shielding region (021) is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion (02).

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Inventors:
ZHANG XIAOXIANG (CN)
LIU MINGXUAN (CN)
GUO HUIBIN (CN)
XU WENQING (CN)
LI XIAOLONG (CN)
WU ZUMOU (CN)
SONG YONGZHI (CN)
Application Number:
PCT/CN2018/113454
Publication Date:
August 15, 2019
Filing Date:
November 01, 2018
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
BEIJING BOE DISPLAY TECH CO (CN)
International Classes:
G03F1/26; G03F1/00
Foreign References:
CN108363270A2018-08-03
US20150301443A12015-10-22
US20060183033A12006-08-17
CN101075086A2007-11-21
CN101738846A2010-06-16
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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