Title:
POLISHING COMPOSITION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/046164
Kind Code:
A1
Abstract:
Provided is a polishing composition capable of efficiently reducing haze and surface defects. A polishing composition including a water-soluble polymer (ML-end) having a hydrophobic region in at least one end of the main chain is provided as a result of the present invention. This hydrophobic region has at least one hydrophobic group derived from a polymerization initiator.
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Inventors:
TSUCHIYA KOHSUKE (JP)
MORI YOSHIO (JP)
MORI YOSHIO (JP)
Application Number:
PCT/JP2014/075124
Publication Date:
April 02, 2015
Filing Date:
September 22, 2014
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
C09K3/14; B24B37/00; H01L21/304
Domestic Patent References:
| WO2014084091A1 | 2014-06-05 |
Foreign References:
| JP2009070904A | 2009-04-02 | |||
| JP2010016344A | 2010-01-21 | |||
| JP2001300285A | 2001-10-30 | |||
| JP2003303791A | 2003-10-24 | |||
| JP2013204468A | 2013-10-07 | |||
| JP2000345145A | 2000-12-12 | |||
| JP2001240850A | 2001-09-04 |
Other References:
See also references of EP 3053978A4
Attorney, Agent or Firm:
ABE MAKOTO (JP)
Makoto Abe (JP)
Makoto Abe (JP)
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