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Title:
SUBSTRATE HAVING ANTIREFLECTIVE LAYER
Document Type and Number:
WIPO Patent Application WO/2014/175124
Kind Code:
A1
Abstract:
　The purpose of the present invention is to provide a substrate having an antireflective layer, and which has exceptional antireflective characteristics as well as high water/oil repellency and good removal of oily soils; and a display device including a substrate having an antireflective layer. Provided are a substrate having an antireflective layer, wherein the substrate having an antireflective layer includes on at least one surface of the substrate an antireflective layer, the antireflective layer containing a silica based porous film having a fluorine-containing organic group, the surface of the substrate on the side opposite from the antireflective layer having an element ratio F/Si, which is calculated from the F1s peak height and the Si2p peak height obtained in surface analysis through scanning X-ray photoelectron spectroscopy (ESCA), of 1 or above, and having mean roughness (Sa) of 3.0 nm or less; and a display device including the substrate having an antireflective layer.

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Inventors:
ISHIZEKI KENJI (JP)
ISOBE AKIRA (JP)
HATANAKA YUKI (JP)
KAWAI YOHEI (JP)
YONEDA TAKASHIGE (JP)
ABE KEISUKE (JP)
Application Number:
PCT/JP2014/060751
Publication Date:
October 30, 2014
Filing Date:
April 15, 2014
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
G02B1/11; B32B7/02; C01B33/12; G09F9/00
Foreign References:
JP2006145709A2006-06-08
JP2009211078A2009-09-17
JPH09314715A1997-12-09
JP3668126B22005-07-06
JP2008139581A2008-06-19
JP2011116947A2011-06-16
JP2013091568A2013-05-16
Other References:
See also references of EP 2990838A4
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
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