Title:
SUBSTRATE-LIQUID TREATMENT DEVICE, SUBSTRATE-LIQUID TREATMENT METHOD, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/107330
Kind Code:
A1
Abstract:
[Problem] To provide: a substrate-liquid treatment device which can determine whether or not a liquid treatment using a heated treatment liquid has been successful, for each substrate; a substrate-liquid treatment method; and a recording medium. [Solution] This substrate-liquid treatment device is provided with a substrate-holding part 52 for holding a substrate W, a treatment liquid-supplying part 53 for supplying a treatment liquid L1 to a treatment surface Sw of the substrate W held by the substrate-holding part 52, a temperature detection sensor 40 for detecting the temperature of the treatment liquid L1 on the treatment surface Sw, and a control unit connected to the temperature detection sensor 40. The control unit obtains the temperature detected by the temperature detection sensor 40 at least in a period after the end of a liquid treatment, between the period after the end of a liquid treatment and the period before the start of the liquid treatment but after formation of a puddle of the treatment liquid L1 on the treatment surface Sw.
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Inventors:
MOTOMATSU KAZUKI (JP)
KANEKO SATOSHI (JP)
KANEKO SATOSHI (JP)
Application Number:
PCT/JP2018/043495
Publication Date:
June 06, 2019
Filing Date:
November 27, 2018
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
C23C18/31; H01L21/304
Foreign References:
| JP2015191895A | 2015-11-02 | |||
| JPH04298017A | 1992-10-21 | |||
| JP2017082290A | 2017-05-18 | |||
| JP2005060792A | 2005-03-10 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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