TARGET MATERIAL, MATERIAL PROCESSING DEVICE, MATERIAL PROCESSING METHOD, MATERIAL PRODUCTION METHOD AND PROGRAM

WIPO Patent Application WO/2016/059674

A1

In one aspect of this invention, the target material (271) is used for a target generation device (26, 120, 140, 51, 112) of an extreme UV generation device (1), wherein the concentration of dissolved oxygen may be less than or equal to the oxygen saturation concentration at a first temperature (Top), which is the temperature of the target material being delivered by the target generation device. In another aspect of the invention, the material processing device may comprise a tank unit (260) for containing the target material, a temperature changing device (140) for changing the temperature of the target material inside the tank unit, and a control unit (201/301) for controlling the temperature changing device so that the target material (273) inside the tank unit is melted at a second temperature (Td) and then solidified, the second temperature (Td) being less than or equal to the first temperature which is the temperature of the target material being delivered by the target generation device of the extreme UV generation device.

WO/2017/189193	REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
WO/2011/102277	EXTREME-ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR GENERATING EXTREME-ULTRAVIOLET LIGHT
JP6422496	Measuring device used to determine the trajectory of a flying object

SHIRAISHI YUTAKA (JP)
HORI TSUKASA (JP)
IWAMOTO FUMIO (JP)

PCT/JP2014/077339

April 21, 2016

October 14, 2014

Click for automatic bibliography generation  

GIGAPHOTON INC (JP)

H05G2/00; H01L21/027

JP2013201118A	2013-10-03
JP2013179029A	2013-09-09
JP2008532293A	2008-08-14

EBISU International Patent Office (JP)
Patent business corporation エビス international patent firm (JP)

View/Download PDF      PDF Help

Previous Patent: X-RAY THIN FILM INSPECTION DEVICE

Next Patent: SPECTROSCOPE AND EMISSION SPECTROSCOPY DEVICE PROVIDED WITH SAME