Title:
TRANSPARENT CONDUCTIVE FILM, PROCESS FOR PRODUCTION OF THE FILM, AND SPUTTERING TARGET FOR USE IN THE PRODUCTION OF THE FILM
Document Type and Number:
WIPO Patent Application WO/2007/142330
Kind Code:
A1
Abstract:
Disclosed is a tin oxide-containing target which is suitable for the formation of a transparent conductive film by DC sputtering process, CD pulse sputtering process or AC sputtering process. More specifically, disclosed is a sputtering target for use in the formation of a transparent conductive film by a sputtering process. The sputtering target comprises: tin oxide as the main component; and at least one element selected from a dopant group A consisting of zinc, niobium, titanium, magnesium, aluminum and zirconium and at least one element selected from a dopant group B consisting of tungsten, tantalum and molybdenum as dopants.
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Inventors:
ODAKA HIDEFUMI (JP)
MITSUI AKIRA (JP)
NAKAGAMA SUSUMU (JP)
MITSUI AKIRA (JP)
NAKAGAMA SUSUMU (JP)
Application Number:
PCT/JP2007/061638
Publication Date:
December 13, 2007
Filing Date:
June 08, 2007
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
ODAKA HIDEFUMI (JP)
MITSUI AKIRA (JP)
NAKAGAMA SUSUMU (JP)
ODAKA HIDEFUMI (JP)
MITSUI AKIRA (JP)
NAKAGAMA SUSUMU (JP)
International Classes:
C23C14/34; C04B35/457; G02F1/1343; H01B5/14; H01B13/00
Domestic Patent References:
| WO2005078152A1 | 2005-08-25 | |||
| WO2007055231A1 | 2007-05-18 |
Foreign References:
| JP2000281431A | 2000-10-10 | |||
| JP2000273622A | 2000-10-03 | |||
| JPH10330924A | 1998-12-15 | |||
| JP2005154820A | 2005-06-16 | |||
| JP2006159526A | 2006-06-22 |
Other References:
APPLIED PHYSICS LETTERS, vol. 78, no. 3, 2001, pages 350
See also references of EP 2039798A4
See also references of EP 2039798A4
Attorney, Agent or Firm:
SENMYO, Kenji et al. (SIA Kanda Square17, Kanda-konyacho,Chiyoda-k, Tokyo 35, JP)
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