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JP3266742B2 |
PURPOSE: To contrive the improvement of gas-barrier property and pinhole resisting property by using a material having at least one layer of the composition containing ethylene-vinyl alcohol copolymer and a specific polyolefin or a resin...
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JP2002060672A |
To provide a thermosetting resin composition for coating which has good storage stability and can form a coating film excellent in curability and resistances to acid and scratch.This composition contains (A) a half-ester-group-containing...
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JP2002055454A |
To provide a positive resist composition having high resolving power in the production of a semiconductor device, also having a rectangular shape and ensuring low edge roughness of a line pattern and a small shift in dimensions in patter...
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JP2002037950A |
To provide a curable rubber composition which can give a cured product (coated coating film) having excellent weather resistance and excellent adhesivity at a large curing speed, has especially excellent adhesivity to the coated films of...
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JP2002037969A |
To provide a moisture-curable modified silicone composition excellent in transparency.This room temperature-curable composition is characterized by comprising (A) a copolymer containing hydrolyzable functional group- containing silicon a...
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JP2002037971A |
To provide a non-water-dispersible resin composition excellent in water resistance, weatherability and adhesion to base materials and suitable as a coating, and to provide a coating composition using the above resin composition.This non-...
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JP2002012643A |
To provide a foam having high flame retardancy and water resistance.The objective foam is composed of (A) a metal salt crosslinked product of a foamed (co)polymer containing (a) a metal-containing ethylenic unsaturated monomer expressed ...
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JP2001354846A |
To obtain a moisture-curing composition capable of holding a low modulus and a high extension and improved in weather resistance.This moisture-curing composition is characterized by compounding a solventless type acrylic polymer which is...
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JP3240392B2 |
PURPOSE: To obtain a cross-linking type aqueous dispersion composition having excellent storage stability, weather resistance of coating film by previously adjusting the pH of a mixed solution comprising a silyl group-containing polymeri...
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JP2001343749A |
To provide a positive-type photosensitive composition for exposure with far-UV, adaptable to exposure in the far UV region with ArF or KrF as a light source in the production of a semiconductor device, ensuring improved line edge roughne...
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JP3235180B2 |
PURPOSE: To provide a liquid composition giving a coating film having excellent flexibility, transparency and property as a gas-barrier to gases such as oxygen, nitrogen and carbon dioxide gas and to provide a molded material coated with...
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JP3224631B2 |
PURPOSE: To obtain a room-temperature-curable composition which can show sufficient adhesion even to a difficulty coatable substrate such as a PVC-covered steel sheet by mixing a silyl-containing acrylic ester polymer with a compound hav...
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JP3226375B2 |
PURPOSE: To obtain a curable resin compsn. which can form a coating film having markedly improved durability, water resistance, hardness, and adhesion to a substrate by compounding an emulsion of a specific silylated polymer with a speci...
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JP3224632B2 |
PURPOSE: To obtain a room-temperature-curable composition having sufficient adhesion even to a difficultly coatable substrate such as a PVC-covered steel sheet by mixing a silyl-containing acrylic ester polymer with a specified amino com...
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JP3221877B2 |
Combinations of alkyl siloxy siloxane-containing polymers admixed with liquid polydimethylsiloxanes are excellent non-stinging, non-irritating liquid coating material for forming films which act as conformable bandages adhering to and pr...
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JP2001290273A |
To provide a positive photoresist composition having satisfactory sensitivity and resolving power and excellent in PED stability in the formation of a contact hole pattern in the production of a semiconductor device. The positive photore...
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JP3212696B2 |
PURPOSE: To provide the subject crosslinkable composition excellent in storage stability and curability, also excellent in the water resistance of the cured products therefrom, suitable as a water-based coating, comprising an emulsion of...
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JP3212697B2 |
PURPOSE: To obtain the subject composition excellent in storage stability by incorporating an alkali (alkaline earth) metal compound, transition metal compound and/or an alcohol in the reactional system during and/or after synthesizing a...
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JP2001253919A |
To provide a fluoroalkyl group-containing trialkylammonium oligomer having both an excellent functionality of fluorine and a silicon compound and an excellent functionality of an ammonium salt, to provide a method of producing the same, ...
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JP2001253921A |
To provide a new fluoroalkyl group-containing phosphonic acid oligomer having excellent ionic conductivity.This fluoroalkyl group-containing phosphonic acid oligomer is represented by the structural formula.
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JP2001513842A |
(57) [Summary] The fine hydrogel material is produced by grinding a product obtained by completing a reaction of submicron acid-disintegrating fluorine-introduced aluminosilicate glass with poly (acrylic acid). This material is used in t...
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JP2001235865A |
To provide a positive photoresist composition giving a resist pattern with a suppressed change in line width when observed with a scanning electron microscope(SEM) in the production of a semiconductor device.The positive photoresist comp...
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JP2001222111A |
To provide a positive resist laminated body adaptable to exposure in the far ultraviolet region, having high resolving power, capable of forming a resist pattern nearly free from line waving and residue on development in a fine pattern o...
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JP2001217010A |
To provide a polymer electrolyte which has excellent preserving stabil ity, high ion conductivity and superior mechanical properties and a lithium secondary battery using same which is compact and light weight and has a large capacity an...
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JP2001201857A |
To provide a positive photoresist composition which improves edge roughness of a resist pattern, does not cause deposition of insoluble matter in the preparation of a resist solution or after storage, is superior in density dependency an...
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JP2001200013A |
To obtain a photosensitive resin composition suitable for manufacturing a multilayered substrate, capable of forming a substrate excellent in adhesion to a metal plating film and dynamic characteristics such as breaking strength, and the...
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JP3190162B2 |
PURPOSE: To obtain the subject composition providing a coating film having excellent gloss and weathering resistance, extremely improved blocking resistance and thixotropic properties, comprising a specific hydrolyzable silyl- containing...
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JP2001194788A |
To provide a positive type photoresist composition which has an improved effect on a margin for exposure (particularly a margin for the exposure of isolated lines) in the production of a semiconductor device, that is, which is less liabl...
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JP2001194787A |
To provide a positive type photoresist composition which ensures improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in preservability at room temperature and in line density dependenc...
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JP3187048B2 |
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JP3187150B2 |
PURPOSE: To prevent the reduction of a vol. during curing and to enhance the close adhesiveness to a base material by reacting a specific silane with (un) substd. γ-butyrolactone in the presence of a Lewis acid. CONSTITUTION: A silane r...
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JP3186081B2 |
PURPOSE: To provide the subject complex containing a specific polymer having a boric acid group and useful as a diabetes treating system, etc., capable of releasing a drug at a controlled rate and having low toxicity and excellent reliab...
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JP2001188348A |
To provide a positive photoresist composition having high resolving power in the production of a semiconductor device, having evaluation with the same light exposure near the margin of resolution by which the size in which a nondense pat...
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JP2001188349A |
To provide a positive photoresist composition having high resolving power in the production of a semiconductor device, giving a photoresist having a rectangular shape and ensuring low edge roughness of a line pattern. The positive photor...
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JP2001172392A |
To obtain a curable composition into which an alkoxysilane group- containing oligomer having been produced by an easy and economical process is incorporated.(A) The oligomer is produced by a continous process from one or more monomers se...
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JP3174401B2 |
PURPOSE: To obtain a functional cross-linked-polyolefin molding in which the cross-link density of the polymer varies from part to part by bringing a molding containing a specific copolymer into contact with a catalyst in a specific mann...
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JP3175013B2 |
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JP3175886B2 |
PURPOSE: To obtain the title composition which can give a cured product excellent in adhesiveness, weather resistance, mechanical properites, etc., by mixing an organic polymer of a specified composition with a polymer made from a polyme...
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JP2001154361A |
To provide a positive type photoresist composition which ensures the improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in preservability and density dependency.The positive type phot...
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JP2001154360A |
To provide a positive type photoresist composition which ensure the improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in low temperature preservability and density dependency.The pos...
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JP3171706B2 |
PURPOSE: To modify a molding of a polyolefin containing a specified comonomer at good efficiency by treating the molding with an alkylene oxide. CONSTITUTION: A molding obtained by melt-molding an alkenylsilane/olefin copolymer and a cat...
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JP3171708B2 |
PURPOSE: To modify a molded polyolefin article efficiently. CONSTITUTION: An alkenylsilane-olefin copolymer is mixed with a catalyst (e.g. a cyclooctadiene complex of rhodium chloride), thermally melted, and molded to give a molded artic...
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JP3171702B2 |
PURPOSE: To efficiently and simply modify a film by bringing a drawn film comprising a copolymer of an alkenylsilane and an olefin into contact with an alkylene oxide in the presence of a catalyst. CONSTITUTION: First, a copolymer of an ...
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JP3171697B2 |
PURPOSE: To obtain the subject polymer having extremely industrial value and excellent solvent resistance by bringing a copolymer of an alkenylsilane and an olefin into contact with a catalyst in the presence of an alkylene oxide. CONSTI...
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JP3171666B2 |
PURPOSE: To obtain a cross-linked polyolefin molding having a cross-linking density differing from one place to another, being nonuniformly cross-linked and having functional properties by irradiating a molding containing a specified cop...
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JP3169452B2 |
PURPOSE: To simply obtain a polyolefin resin composition excellent in physical properties such as flexural rigidity, tensile strength and impact strength by melt-mixing an alkenylsilane-olefin copolymer with a filler impregnated with a c...
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JP3168482B2 |
PURPOSE: To obtain the subject composition excellent in storage stability, weatherability and durability by dispersion polymerization of a mixture of a silyl functional group-contg. vinyl monomer and a specific monomer in an aqueous solu...
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JP3167172B2 |
PURPOSE: To obtain a curable composition having a long pot life and good curability by incorporating a monoalkyltin salt of a fatty acid as a curing catalyst into a vinyl resin having a hydrolyzable silyl group. CONSTITUTION: A vinyl res...
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JP2001131378A |
To develop an active energy curing composition excellent in curability. This active energy ray curing composition is characterized as compounding the following components. (A) 5-100 pts.wt. of a silane compound containing ≥4 trialkoxys...
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JP2001123152A |
To obtain an antistatic agent having excellent permanent antistatic properties excellent in resistance to washing with water a well and suitable for an incorporation type. This antistatic agent composition comprises a mixture of 30-99 wt...
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