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JP2012197386A |
To provide a pressure sintering device that manufactures a high luminance luminous material excellent in afterglow property.The pressure sintering device includes a mold consisting of a punch and a die, wherein the punch and die make tun...
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JP5050513B2 |
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JP5048998B2 |
To provide a heating element device capable of efficiently obtaining a burned substance by using microwaves. The heating element device has a heating element moving mechanism for moving the heating element according to temperature variat...
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JP2012193753A |
To enable a pipe rehabilitation member to be heated until a hardly heatable part of the pipe rehabilitation member is sufficiently softened, because a softened state of the hardly heatable part thereof can be grasped from the result of m...
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JP5041463B2 |
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JP5041723B2 |
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JP5027719B2 |
A crucible handling shuttle (16) includes a pair of opposed dual crucible-gripping arms (25,27) mounted on a rotatable head (22) and moves between an induction furnace pedestal (12) and a crucible loading station (50), such that one pair...
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JP5023093B2 |
A high-frequency inductive heating apparatus of ceramic material, whereby the nonconductive ceramic specimen in which induced current is not generated at room temperature is rapidly heated in a preheating housing, and a pressure-less sin...
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JP5015541B2 |
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JP5007804B2 |
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JP4996760B1 |
To provide a batch type heat treatment furnace capable of heat treatment at a stable temperature. The furnace body 10 has a box-shaped furnace main body 11 and is subjected to heat treatment, and a moving table 20 for moving a heat-treat...
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JP4986964B2 |
A crystal-growing furnace with a convectional cooling structure includes a furnace body, a heating room, and at least one heater. The heating room is accommodated in the furnace body, and includes an upper partition, a plurality of side ...
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JP4981543B2 |
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JP4970949B2 |
A steam reforming apparatus (21) is configured to be placed in an industrial furnace (100) sintering an article to be sintered with a heat generated by fusing a fuel and to use a fed hydrocarbon and fed steam as raw materials. The appara...
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JP4966961B2 |
A system for heat-treatment of large metallic samples including a microwave heating apparatus with a wave guide, means for monitoring and measuring temperature, holding means for holding the metallic sample. The holding means comprises a...
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JP4947783B2 |
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JP4949192B2 |
The actual temperature in the interior of the firing furnace is measured and stored. The temperature integral recorded at discrete points is determined over the course of time and is stored. The recorded temperature integral is used in a...
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JP4927433B2 |
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JP2012084637A |
To improve a heat treatment apparatus used in a calcination process when providing an electrode on the front and back of a silicon wafer, and to realize an ideal temperature profile in calcination.The heat treatment apparatus includes a ...
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JP2012509192A |
The invention relates to a method for regulating the temperature of a hot isostatic press and to a hot isostatic press, comprising a pressure container (1) having an interior horizontal loading space (19) and insulation (8) arranged in b...
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JP2012078048A |
To provide a heat treatment device that utilizes a catalyst activation heater for heat treatment, and suppresses increase in size and costs of the device.This heat treatment device 1A includes a heat treatment furnace 20 for housing a wo...
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JP2012074647A |
To prevent unevenness in thermal history of each substrate due to substrate supply failure without causing the increase of the cost and the device size.A substrate thermal treatment system 10 of this invention includes a thermal treatmen...
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JP4912463B2 |
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a h...
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JP2012068002A |
To provide a heating device which can heat at a higher temperature while securing the uniformity of distribution of heat radiated on a heated object.The heating device is configured arranging a plurality of rod-like infrared lamps 11 on ...
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JP4900776B2 |
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JP4897256B2 |
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JP4896954B2 |
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JP4896952B2 |
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JP4892270B2 |
To optimize flame shape by making a flame direction changeable. A burner nozzle 7 is arranged in a gas supply hole formed in a burner tile serving as a part of a furnace wall, and intake-exhaust holes 9, 10 comprising a ventilable heat s...
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JP2012037218A |
To provide a ceramic baking furnace capable of minimizing defect of a ceramic substrate to be baked by preparing uniform gas atmosphere inside of the baking furnace.This ceramic baking furnace includes a case having an internal space in ...
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JP3173519U |
To provide an electric kiln for ceramics which enables three types of reduction firing using both a reducing flame of a burner and a reducing material in addition to oxidative firing. In an electric kiln for pottery that heats the inside...
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JP4868091B2 |
Provided is a method for heat treating longer-length products, in which a cylindrical batch-type heat treatment furnace with opposite ends thereof being enclosed and with the inner space thereof being divided into a plurality of heating ...
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JP4861092B2 |
To provide a technique which can suitably propriety of a filling-up characteristic of mud material without using large-scale facilities, such as simulation furnace. In a first cylindrical body 21 and a second cylindrical body 22, the mud...
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JP4859268B2 |
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JP2012013256A |
To provide a batch furnace which allows the atmospheric gas to come in uniform contact with all objects to be baked, for baking the objects well.In the condition in which a hearth 3 is inserted into an opening part 2b to be set to a furn...
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JP4855785B2 |
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JP4858659B2 |
In a method for heat treating a metal tube or pipe for a nuclear power plant, the tube or pipe being accommodated in a batch-type vacuum heat treatment furnace, when the tube or pipe is laid down on and is subjected to heat treatment on ...
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JP2011246316A |
To provide a method for firing ceramic for preventing inflow of impurities such as oxygen into a firing container.An atmospheric gas is directly supplied from a gas supply source 5 arranged outside a firing furnace 1 into the firing cont...
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JP4826083B2 |
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JP4828934B2 |
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JP4823532B2 |
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JP4808425B2 |
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JP2011208821A |
To pursue compression of processing time in a conventional vacuum furnace, accurate quality control, optimization of a totalized control mainly intended for energy saving, and improvement of productivity.A partition plate 3 surrounding a...
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JP2011207684A |
To provide a furnace core tube which controls heat stress, and the reaction with strong alkali components generated from the material to be heat-treated in the furnace core tube, has an extended service life, and is of a high industrial ...
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JP4799071B2 |
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JP2011202940A |
To provide a baking furnace for ceramic product, and a baking method using the same.The baking furnace for ceramic product includes a furnace body containing a heat insulating material; a setter disposed inside the furnace body, and havi...
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JP4791695B2 |
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JP4782068B2 |
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JP4777688B2 |
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JP2011174703A |
To provide a degreasing furnace capable of drastically reducing electric power consumption compared to a conventional small degreasing furnace including a combustion furnace and of suppressing emissions of high-temperature exhaust gas.Th...
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