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WO/2005/043241A2 |
A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least on...
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WO/2005/040924A2 |
A photoresist spray coating process for deep trenched substrates. According to one implementation of the invention, the substrate surface is primed with a primer having a water contact angle between forty and fifty degrees. A spray nozzl...
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WO/2005/038524A2 |
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hyd...
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WO/2005/036261A1 |
A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable backbone moiety; Z i...
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WO/2005/031458A2 |
A photomask (1900) for producing partial-depth features (712 and 912) in a photo-imageable polymer layer (412) on a wafer of a chip scale package (200) using exposure tools capable of resolving sizes of a critical dimension or larger, ha...
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WO/2005/026839A2 |
Compositions and methods for production of color images using phthalocyanine precursor-containing color forming compositions are described. The color forming composition can include a phthalocyanine precursor, an infrared absorber, and a...
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WO/2005/024325A2 |
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing...
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WO/2005/022600A2 |
Disclose are methods, systems, and processor program products for filtering overlay measurements, including generating a residual between a measured overlay displacement (212) and an overlay displacement based on a model of reticle erros...
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WO/2005/013006A1 |
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a...
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WO/2005/013007A1 |
The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a ...
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WO/2005/011992A1 |
A process for providing a security paper, in particular a banknote, with a coloured marking, comprising providing a photosensitive preparation on a portion of said document and submitting at least selected areas of said portion to a ligh...
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WO/2005/008850A2 |
A method and apparatus (Figure 1) for laser-assisted fault mapping synchronizes laser control (11) whith tester unit (6). The inventive method provides for laser-assisted pseudo-static fault mapping to localize defects in a device (2) wh...
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WO/2005/001898A2 |
A method of designing and forming a reticle (404), as well as the manufacture of a semiconductor substrate (410) using the reticle, includes defining a first edge of a reticle layout file. The first edge corresponds to a reference featur...
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WO/2005/001567A1 |
An improved digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation. The printing elements of the invention comprise a reflective la...
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WO/2005/001565A1 |
A black and white photothermographic material is imaged and heat developed to provide an image that has an image tone that is characterized such that the value for b* at an optical density of 1.0 is greater than the value for b* at Dmin....
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WO/2005/001901A2 |
A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selective...
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WO/2005/001432A2 |
The present invention is directed towards a fluid composition comprising a perfluoroehter compound; the fluid composition has an absorbance of less than about 2 cm-1 at a wavelength of about 157 nm. The present invention also comprises a...
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WO/2004/114382A1 |
A method for forming a pattern is disclosed which comprises a step wherein a fluid film is made from a material with fluidity, a step wherein a pressing surface of a pressing member which has at least one of a projected portion and a rec...
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WO/2004/109397A1 |
A method of processing photographic material in which a processing chamber is indirectly heated to an aim temperature, the chamber being replenished substantially simultaneously with the passage of the material through the chamber. Eithe...
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WO/2004/109396A1 |
A radiographic imaging assembly comprises a radiographic silver halide film and a single fluorescent intensifying screen that has protective overcoat that comprises a miscible blend of a first polymer that is poly(vinylidene fluoride-co-...
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WO/2004/107042A1 |
A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually (SET1, SET2) and then o...
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WO/2004/107043A1 |
A method for reproducing on a support a digital holographic matrix comprises the steps of obtaining said matrix by the application of simulation software to a high resolution image, exposing said support by reproducing the holographic ma...
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WO/2004/107407A2 |
A photolithographic method of making an information storage device having different storage characteristics at a plurality of discrete memory locations thereon, comprises the steps of: (a) providing a substrate having a surface portion, ...
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WO/2004/107379A1 |
The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include a...
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WO/2004/094967A2 |
In accordance with this invention, there is provided a method of imaging, measuring and displaying a 3-dimensional dose distribution of an energy field in a translucent 3-dimensional object comprises: applying an energy field to the obje...
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WO/2004/095133A1 |
A method of forming images through exposure according to digital data and development so as to obtain a print; and a silver halide color photographic lightsensitive material for use therein. In particular, a method of forming images wher...
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WO/2004/092832A2 |
Methods for the determination of center of focus and process control for a lithographic tool. Diffraction signatures are obtained from a plurality of diffraction structures located within multiple different focus setting fields. Variabil...
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WO/2004/093148A2 |
The invention describes a methodology based on the interpolation (503) of the correction (501 and 502) between selected evaluation points (505 and 506) of the target layout (504). By connecting the correction points this technique provid...
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WO/2004/090635A1 |
A method of producing a photomask (10) that poses a problem with a CD accuracy lowered due to a loading effect; and technique for restricting a loading effect. A method of producing a photomask (10) in which a chromium pattern (21) havin...
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WO/2004/086143A2 |
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle o...
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WO/2004/086138A1 |
A method of processing uses a common delivery means to supply a starter solution and a replenisher solution to the processing apparatus. The volume of the delivery means is equal the volume of starter solution required to convert a fixed...
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WO/2004/086139A1 |
A method of photographic processing in which the cleaning solution used for washing the processor comprises at least a constituent part of the processing solution.
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WO/2004/083960A2 |
The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the p...
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WO/2004/079779A2 |
An attenuated phase shift mask (10 or 20) includes a substrate (12 or 22) and an attenuation stack (11 or 21) overlying the substrate. The attenuation stack includes a chromium layer or ruthenium layer (14 or 24) overlying the substrate,...
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WO/2004/079780A2 |
A patterned reflective semiconductor mask (10) uses a multiple layer ARC (24, 26, 28) overlying an absorber stack (22) that overlies a reflective substrate (12, 14). The absorber stack has more than one layer and an upper layer of the ab...
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WO/2004/077154A2 |
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift...
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WO/2004/072735A1 |
A method for correcting a photomask by the optical proximity effect, enabling decrease of the inter-mask difference in the pattern density-dependent error of the line width between a test mask and a corrected mask. The method comprises a...
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WO/2004/072734A2 |
An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask h...
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WO/2004/068239A1 |
An image forming method for forming a stable image excellent in sharpness with no variation in density in the image part even after continuous printing by means of a high-speed digital printer. The method in which a silver halide color p...
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WO/2004/066358A2 |
The present invention generally relates to improved binary half tone ('BHT') photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices)...
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WO/2004/066028A2 |
A method for determining one or more process parameter settings of a photolithographic system is disclosed. The method is performed using a scatterometry tool (258) to measure a latent image of a pattern, a partially developed pattern, o...
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WO/2004/065287A2 |
A photoresist layer (417) on a semiconductor wafer (419) is patterned using a mask (401) with an absorbing layer (107) that has been repaired by using an additional light-absorbing carbon layer (105) that collects ions that are used in t...
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WO/2004/056377A1 |
The invention refers to an orthochromatic system of rare earh elements screen film for intra-oral odontological radiology, which is characterized by comprising: 1.a) a protective layer (1-PL) b) one phosphor emulsion layer (1-PEL), compr...
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WO/2004/049063A2 |
A photomask and method for creating a protective layer on the photomask are disclosed. The method includes placing a photomask including a patterned layer formed on at least a portion of a substrate in a chamber. Oxygen is introduced int...
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WO/2004/046812A1 |
A silver halide photosensitive material having a high photosensitivity, undergoing little fog, and having a favorable gradation, a long shelf life, a favorable pressure resistance, an excellent text image reproducibility, and an excellen...
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WO/2004/047121A2 |
The invention relates to a protective layer for an image detector used for an x-ray image. Said image detector comprises a layer of luminescent material (3), which is to be protected against mechanical stress and moisture. A polymeric pr...
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WO/2004/044967A1 |
Accuracy of position of a mask pattern is improved by reducing stress change in a thin film layer which occurs during a manufacturing process of a transfer mask. A method for manufacturing a transfer mask is characterized by comprising a...
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WO/2004/042344A2 |
The present invention relates to a method of manufacturing a detection device which involves providing a substrate having a layer of gold and a first layer of photosensitive material. Next, the substrate is subjected to a first level pho...
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WO/2004/039601A1 |
Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, the printin...
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WO/2004/040371A2 |
Novel copolymers suitable for forming the top layer photoimageable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition an ...
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