Title:
CLEANING METHOD AND HEAT TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2021166238
Kind Code:
A
Abstract:
To provide a technique capable of suppressing over-etching of a member provided near a furnace opening of a reaction tube.SOLUTION: A cleaning method according to an embodiment of the present disclosure which removes deposits in a reaction tube with a furnace port at one end includes a step of removing deposits by introducing cleaning gas containing hydrogen fluoride into the reaction tube in a state in which the inside of the reaction tube in which the furnace opening is closed by a lid is maintained at a temperature at which water can exist as a liquid film and the furnace opening is locally heated.SELECTED DRAWING: Figure 3
Inventors:
HASEGAWA TOMOYA
WATABE TSUBASA
WATABE TSUBASA
Application Number:
JP2020068794A
Publication Date:
October 14, 2021
Filing Date:
April 07, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; C23C16/44; H01L21/3065
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito