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Title:
反射防止ポリマーコーティングに使用する非芳香族発色団
Document Type and Number:
Japanese Patent JP4831909
Kind Code:
B2
Abstract:
An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

Inventors:
Xiao Xie
Cox robert
Despandes Shree Ram Vi.
Flame Tony Dee.
Puri Gadda Rama
Application Number:
JP2001542270A
Publication Date:
December 07, 2011
Filing Date:
September 20, 2000
Export Citation:
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Assignee:
Brewer Science INC.
International Classes:
G03F7/004; G03F7/11; C08G18/38; C08G59/16; G03F7/09
Domestic Patent References:
JPS6341844A1988-02-23
JP2002502982A2002-01-29
JPH0792684A1995-04-07
JP2001521187A2001-11-06
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa