シリコン層にフィーチャーをエッチングする方法およびその装置

Title:

シリコン層にフィーチャーをエッチングする方法およびその装置

Document Type and Number:

Japanese Patent JP5833600

Kind Code:

B2

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Inventors:

Kebi robert
Lynn Frank
Winikzek Yaroslow
Chen Wan-Lin
McDonnell Erin
Zen Lily
Russig Stephen
Bogart Jeff
Ruth Camellia

Application Number:

JP2013141623A

Publication Date:

December 16, 2015

Filing Date:

July 05, 2013

Export Citation:

Assignee:

LAM RESEARCH CORPORATION

International Classes:

H01L21/3065

Domestic Patent References:

Foreign References:

WO2007040717A2
WO2003056617A1

Attorney, Agent or Firm:

Meisei International Patent Office

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