アクリル酸エステル誘導体、高分子化合物およびフォトレジスト組成物

Title:

アクリル酸エステル誘導体、高分子化合物およびフォトレジスト組成物

Document Type and Number:

Japanese Patent JP5496715

Kind Code:

B2

Abstract:

To provide an acrylic acid derivative useful as a raw material of a polymer compound with less swelling in development, a polymer compound obtained by polymerizing a raw material containing the acrylic acid derivative, a photoresist composition with improved LWR (line width roughness) containing the polymer compound, and a method for producing the acrylic acid ester.

The acrylic acid ester derivative is represented by general formula (1), (wherein R1indicates a hydrogen atom, a methyl group or a trifluoromethyl group; and R2, R3and R4indicate each independently a hydrogen atom, a 1-6C alkyl group or a 3-6C cycloalkyl group).

Inventors:

Osamu Nakayama
Takashi Fukumoto

Application Number:

JP2010053146A

Publication Date:

May 21, 2014

Filing Date:

March 10, 2010

Export Citation:

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Assignee:

KURARAY CO.,LTD.

International Classes:

C07D327/04; C08F220/38; G03F7/039; H01L21/027

Domestic Patent References:

JP2006327932A
JP2008521039A

Foreign References:

WO2011016440A1

Other References:

J. Org. Chem.,1980年,45,p.2419-2425

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