Title:
ACTIVE ENERGY RAY-CURABLE COMPOSITION AND FINE UNEVEN STRUCTURE USING THE SAME
Document Type and Number:
Japanese Patent JP2014077040
Kind Code:
A
Abstract:
To provide an active energy ray-curable composition capable of forming a fine uneven structure having high stain resistance, and to provide a fine uneven structure using the same, and an anti-reflection article.
There is provided an active energy ray-curable composition which comprises: 25 to 75 pts.mass of a polyfunctional monomer (A) having two or more radically polymerizable functional groups in the molecule; 25 to 75 pts.mass of a (meth)acrylate monomer (B) having a siloxane structure; and 0.1 to 5 pts.mass of an active energy ray polymerization initiator based on 100 pts.mass of the polymerizable monomer components.
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Inventors:
ONOMOTO HIROSHI
Application Number:
JP2012224752A
Publication Date:
May 01, 2014
Filing Date:
October 10, 2012
Export Citation:
Assignee:
MITSUBISHI RAYON CO
International Classes:
C08F2/48; B29C59/02; C08F230/08; C08F290/06; G02B1/11; B29K33/04; B29L7/00; B29L11/00
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