Title:
BASE ISOLATION STRUCTURE
Document Type and Number:
Japanese Patent JP2010255666
Kind Code:
A
Abstract:
To provide a base isolation structure obtained using a rubber composition capable of improvin temperature dependency while maintaining high buckling generation distortion.
The base isolation structure uses the rubber composition containing a rubber component that contains 25 mass% or more of a butadiene-based polymer having a molecular weight distribution (Mw/Mn) of 1.6-3.5, a cis-1,4 bond content in a 1,3-butadiene monomer unit being 98% or larger and a vinyl bond content being 0.3% or smaller in Fourier transform infrared spectroscopy measurement.
Inventors:
NISHIMURA KEIJI
Application Number:
JP2009103433A
Publication Date:
November 11, 2010
Filing Date:
April 21, 2009
Export Citation:
Assignee:
BRIDGESTONE CORP
International Classes:
F16F15/04; C08F36/06; C08L7/00; C08L9/00; C08L45/02; C08L57/00; C08L57/02; C08L61/04; C08L67/00; C08L93/04; F16F1/40
Domestic Patent References:
JPH09176380A | 1997-07-08 | |||
JP2000034320A | 2000-02-02 | |||
JPH11255963A | 1999-09-21 | |||
JP2007063328A | 2007-03-15 | |||
JPH0337435A | 1991-02-18 |
Foreign References:
WO2007066651A1 | 2007-06-14 | |||
WO2008078814A1 | 2008-07-03 | |||
WO2008084724A1 | 2008-07-17 | |||
WO2006112450A1 | 2006-10-26 |
Attorney, Agent or Firm:
Tamotsu Otani
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