Title:
CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3890979
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a positive chemical amplification type resist composition having favorable various kinds of resist performances such as sensitivity and resolution and particularly excellent in dry etching durability.
SOLUTION: The positive resist composition comprises a resin having polymerization units expressed by general formulae (I) and (II) or polymerization units expressed by general formulae (I), (II) and (III), and the resin itself is insoluble or hardly soluble with an alkali aqueous solution but converted into soluble by the effect of an acid, and an acid generator and a polyfunctional epoxy compound. In the formulae, each of R1, R2, R3 and R9 independently represents hydrogen, a halogen, hydroxyl group, a 1-14C alkyl group, an alicyclic group or a lactone ring, each of n and 1 represents an integer from 0 to 4, each of R4 and R5 independently represents hydrogen or a 1-4C alkyl group, either R6 or R7 or both of them represent 1-6C alkyl groups substituted with at least one fluorine atom, and R8 represents an acid unstable group which dissociates in the presence of an acid.
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Inventors:
Koji Toishi
Yoshiko Miya
Yasunori Uetani
Yoshiko Miya
Yasunori Uetani
Application Number:
JP2001395887A
Publication Date:
March 07, 2007
Filing Date:
December 27, 2001
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/039; C08F232/08; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F232/08; G03F7/004; H01L21/027
Domestic Patent References:
| JP2002201219A | ||||
| JP2004536328A | ||||
| JP2002338634A | ||||
| JP2002333715A | ||||
| JP2002145962A | ||||
| JP2001302735A | ||||
| JP2001209181A | ||||
| JP2001027806A |
Foreign References:
| WO2003006413A1 |
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto
Toru Nakayama
Masayuki Enomoto