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Patent Searching and Data


Title:
CLEANING APPARATUS AND METHOD OF CLEANING SUBSTRATE
Document Type and Number:
Japanese Patent JP2010017634
Kind Code:
A
Abstract:

To provide a cleaning apparatus capable of definitely cleaning side sections where an electrode is each provided even if the thickness of a substrate is fluctuated.

The cleaning apparatus that cleans the upper/lower surfaces of the sides in a substrate includes a loading table on the upper surface of which the substrate is supplied and loaded and which position-drives the substrate, tape-like cleaning members 15 that run along the side of the substrate positioned by the loading table by being sent from a supply reel and wound by a winding reel, pressing roller 22a, 22b disposed as opposed to cleaning members, upper/lower cylinders 23a, 23b that drive the pressing rollers to press the cleaning members onto the sides of the substrate, load cells 43a, 43b that detect a pressurizing force applied to the cleaning members when the pressing rollers press the cleaning members onto the substrate by the upper/lower cylinders, and electro-pneumatic regulators 44a, 44b and a controller 45 that perform control so as to allow the pressurizing force applied to the pressing rollers by the upper/lower cylinders to be constant based on detections by a load cell.


Inventors:
KOGURE MASAFUMI
Application Number:
JP2008179330A
Publication Date:
January 28, 2010
Filing Date:
July 09, 2008
Export Citation:
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Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
B08B1/02; G02F1/13; G02F1/1333
Attorney, Agent or Firm:
Takehiko Suzue
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Tetsuya Kazama
Katsumura Hiro
Shoji Kawai
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen