Title:
CLEANING SYSTEM
Document Type and Number:
Japanese Patent JP3343503
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make on overall cleaning system small and to reduce the cleaning processing time, when a front side and a rear side of a substrate such as a semiconductor wafer are cleaned.
SOLUTION: A wafer W is supported horizontal with rotary guide members 2 placed at an interval along a contour of the wafer, and the rotary guide members 2 are driven so as to move the circumferential ridge of the wafer W in a circumferential direction and to turn the wafer. Cleaning brushes 41, 42 that clean the front side and the rear side of the wafer W and a nozzle 61 that supplies a cleaning liquid to the front side and the rear side of the wafer W are provided. Sliding the wafer W and the cleaning brushes 41, 42 at the same time clean both the front side and the rear side of the wafer W. Since two cleaning parts and inverting parts having been required for a conventional system are not required, the overall system is made small in size and the number of processes of the system is reduced, than the processing time is shortened.
Inventors:
Nobuo Konishi
Kenji Sekiguchi
Keizo Hirose
Kenji Sekiguchi
Keizo Hirose
Application Number:
JP36268897A
Publication Date:
November 11, 2002
Filing Date:
December 12, 1997
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; (IPC1-7): H01L21/304
Domestic Patent References:
| JP969502A | ||||
| JP1105376A | ||||
| JP60143634A | ||||
| JP1184831A | ||||
| JP8241851A | ||||
| JP1179422A |
Attorney, Agent or Firm:
Toshio Inoue (1 outside)