Title:
電子分光分析方法及び分析装置
Document Type and Number:
Japanese Patent JP4497889
Kind Code:
B2
Abstract:
[Task] The invention enables uniformly etching a surface of a sample with an improved repeatability, and etching at a low cost without requiring any large-scale equipment. [Means for Solving the Problem] In an electron spectroscopy analytical apparatus (1) for executing an analysis of a composition, a chemical state and the like of a surface of a sample (4) or in a depth direction thereof by irradiating an X-ray to the sample (4) from a high-energy particle irradiating unit (6) within a vacuum chamber (2) under a vacuum atmosphere, and detecting a kinetic energy of electrons emitted from the sample (4) by an electric energy analyzer (7) on the basis of a photoelectric effect, the surface of the sample (4) is ion-etched by irradiating a fullerene ion beam to the surface of the sample (4) from an ion gun (8) before irradiating the high-energy particle to the sample (4).
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Inventors:
Noriaki Sanada
Zenji Ohashi
Yamamoto
Rei Oiwa
Zenji Ohashi
Yamamoto
Rei Oiwa
Application Number:
JP2003368372A
Publication Date:
July 07, 2010
Filing Date:
October 29, 2003
Export Citation:
Assignee:
ULVAC PHI Co., Ltd.
International Classes:
G01N23/227; G01N1/34; G01N23/22; G01N23/225
Domestic Patent References:
| JP9106780A | ||||
| JP2001312994A | ||||
| JP2002195965A |
Foreign References:
| GB2386747A | ||||
| US20030080292 |
Other References:
Weibel D,他5名,A C60 Primary Ion Beam System for Time of Flight Secondary Ion Mass Spectrometry:Its Develpoment and Secondary Ion Yield Characteristics,Analytical Chemistry,2003年 4月 1日,Vol.75,No.7,P.1754-1764
Attorney, Agent or Firm:
Yoshihiro Shimizu
Shinichi Abe
Yuji Tsujida
Masashi Yoshioka
Shinichi Abe
Yuji Tsujida
Masashi Yoshioka