FLUORINE-CONTAINING POLYCYCLIC COMPOUND, POLYMER COMPOUND USING IT AS RAW MATERIAL AND PHOTORESIST MATERIAL USING IT

Title:

FLUORINE-CONTAINING POLYCYCLIC COMPOUND, POLYMER COMPOUND USING IT AS RAW MATERIAL AND PHOTORESIST MATERIAL USING IT

Document Type and Number:

Japanese Patent JP2004099689

Kind Code:

A

Abstract:

To provide a new fluorine-containing compound and a polymer compound using it.

A series of new fluorine-containing tricyclononene compounds as specific compounds having a tricyclic skeleton and a high fluorine content and containing a hydroxy group(s) and polymers using these monomers are synthesized. The fluorine-containing tricyclononene compounds being new polymerizable monomers and the polymer compounds using the monomers are highly transparent to a wide range of wavelengths from the vacuum-ultraviolet region to the optical communication region in spite of their high fluorine content because of the presence of polar groups in the same molecule, have a close adhesion to substrates and a good film-forming ability and a high etching resistance because of their alicyclic structure.

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Inventors:

MIYAZAWA SATORU
KOMORIYA HARUHIKO
MAEDA KAZUHIKO

Application Number:

JP2002261323A

Publication Date:

April 02, 2004

Filing Date:

September 06, 2002

Export Citation:

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Assignee:

CENTRAL GLASS CO LTD

International Classes:

G03F7/039; C07C33/44; C08F32/08; H01L21/027; (IPC1-7): C08F32/08; C07C33/44; H01L21/027

Attorney, Agent or Firm:

Yoshiyuki Nishi

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