To obtain a new fluorocycloalkane derivative useful as a monomer for producing radiation-sensitive resists highly transparent to radiations with ≤160 nm wavelengths and highly resistant to dry etching.
The new derivative is 1,2,2,3,3,4,4,5-octafluorocyclopentane-α,α- dimethylmethyl 2-trifluoromethyl-bicyclo[2.2.1]-5-heptene-2-carboxylate of formula (1). Because of containing the highly fluorinated cycloalkane moiety on the ester side chain, this derivative has a high fluorine content, and when a high- molecular compound obtained by polymerizing this derivative as the monomer is used as a base polymer for resist resins, radiation-sensitive resists highly transparent to radiations with a short wavelength of 160 nm and highly resistant to dry etching can be produced.
KOMORIYA HARUHIKO
MAEDA KAZUHIKO
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