To provide the guide device of a photographic sensitive material constituted so that an infiltrating spot caused by the infiltration of developing processing liquid is prevented from being formed.

A guide 10 guiding the movement of the photographic sensitive material A fed to a liquid level from the developing processing liquid of processing tanks T1 and T2 is formed of stainless steel. By mirror-finishing the guide surfaces 12 and 13 of the guide 10 guiding the movement of the material A by buffing, water repellency is enhanced. Thus, the developing processing liquid attached to the material A is prevented from being attached to the guide surfaces 12 and 13. Besides, the developing processing liquid is prevented from being infiltrated into the material A which is carried next.