To provide a pattern generator for solving the problem of stitching error.
An apparatus and method of forming a pattern on a work piece are provided. The apparatus includes a light source for radiating a wide range of light from extreme ultraviolet ray to infrared ray; a spatial light modulator configured to be mounted on a precision stage, to have many modulation elements, and to be illuminated by the radiated light; a projecting system for forming the image of the spatial light modulator on the work piece; an electric data processing and transmitting system for receiving the digital expression of the pattern to be written to modulate the pattern to a modulation signal, and to supply the modulated signal to the space light modulator; a high precision mechanical system for mutually positioning the work piece and/or projection system; an electronic control system for printing a pattern to the work piece by regulating the position of the work piece, the supply of modulated signal to the spatial light modulator, and radiation intensity; and a means for rotating the system of coordinate of the pattern to be printed against the system of coordinate of the work piece on a positioning stage.
| JP2006255590 | SUBSTRATE TREATMENT APPARATUS |
| JP2005214997 | METHOD FOR FORMING RESIST PATTERN |
| JPH03153017 | RESIST COATER |
| JPH0423314A | 1992-01-27 | |||
| JPH1050604A | 1998-02-20 | |||
| JPH09260250A | 1997-10-03 | |||
| JPH09148221A | 1997-06-06 |
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto
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