Title:
Lighting system of microlithography projection exposure equipment
Document Type and Number:
Japanese Patent JP6343344
Kind Code:
B2
Abstract:
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).
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Inventors:
Degunter Marx
Davidenko Vladimir
Kolb Thomas
Shresener Frank
Hilt stephanie
Hogel wolfgang
Davidenko Vladimir
Kolb Thomas
Shresener Frank
Hilt stephanie
Hogel wolfgang
Application Number:
JP2016533545A
Publication Date:
June 13, 2018
Filing Date:
November 13, 2014
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00; G02B26/02
Domestic Patent References:
| JP2009124139A | ||||
| JP2002222757A | ||||
| JP2009527112A |
Foreign References:
| WO2012100791A1 | ||||
| WO2002075440A1 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Hiroshi Oura
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Hiroshi Oura