To suppress the influence of a capacitance component between a signal wire and a pixel wire on a display by forming an inter-layer insulating film of an organic material which has high transparency and specifying the film thickness of a scanning line and a signal line at an intersection part.
On an active matrix substrate, gate signal wires 2 and source signal wires 3 are formed crossing each other at right angles and TFTs 8 as switching elements are formed nearby their intersection parts. Further, pixel electrodes 5 are formed on the inter-layer insulating films, formed of the organic material with high transparency which is provided covering them, over the signal wires 2 and 3, and an additional capacitance part 6 is formed covering the pixel electrodes. Here, the film of the wires at the intersection part of a gate signal wire 2 and a source signal wire 3 is made less in thickness than other parts. Consequently, the film thickness of the inter-layer insulating film on the intersection can be increased and the capacitance component formed between the signal wire and pixel wire can be suppressed small.
OKAMOTO MASAYA
KANAMORI KEN
