Title:
合成石英ガラス基板の製造方法
Document Type and Number:
Japanese Patent JP6669287
Kind Code:
B2
Abstract:
SOLUTION: A method of manufacturing a synthetic quartz glass substrate includes the processes of: preparing a synthetic quartz glass block; applying a predetermined liquid to two surfaces which are an arbitrary surface of the synthetic quartz glass block and a surface opposed thereto; measuring a birefringence index distribution with light which impinges on one of those surfaces and exiting from the other; determining, based upon the obtained birefringence index distribution, that when a glass block is selected, a glass block is good which has a birefringence index distribution having no maximum value of a birefringence index within an effective range on the block corresponding to an effective range of a substrate obtained from the block; and cutting, after the process for selection, the block determined as a good block into a plate and then processing the obtained plate body.EFFECT: According to the present invention, substrates which are suitable for respective grades can be selected for synthetic quartz glass substrates for photomask to be used, especially, for an ArF excimer laser etc., in a relatively early stage of a manufacturing process, and thus the substrates have good productivity and economical efficiency.SELECTED DRAWING: None
Inventors:
Hisashi Yagi
Daimi Harada
Masaki Takeuchi
Kazuo Shirota
Kazuhiko Aoki
Daimi Harada
Masaki Takeuchi
Kazuo Shirota
Kazuhiko Aoki
Application Number:
JP2019014152A
Publication Date:
March 18, 2020
Filing Date:
January 30, 2019
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C03B20/00; G01N21/23; G03F1/60
Domestic Patent References:
| JP2013140237A | ||||
| JP4688150B2 | ||||
| JP8075652A | ||||
| JP63154947A | ||||
| JP2004145309A | ||||
| JP201232786A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki