塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP5856414

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a pattern which has outstanding line edge roughness.SOLUTION: A salt is shown by formula (I), and the resist composition includes the salt. In the formula (I), Qand Qindependently mutually denote a fluorine atom or a 1-6C perfluoroalkyl group; Ldenotes a divalent 1-17C saturated hydrocarbon group, and a methylene group contained in the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; Rdenotes a hydroxy group, a 2-7C alkoxycarbonyl group or a 2-7C alkoxycarbonyloxy group; s independently mutually denotes an integer of 1-3; and Zdenotes an organic counter ion.

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Inventors:

Yukako Adachi
Koji Ichikawa

Application Number:

JP2011201665A

Publication Date:

February 09, 2016

Filing Date:

September 15, 2011

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