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Patent Searching and Data


Title:
METHOD FOR FORMING THIN FILM PATTERN AND METHOD FOR FORMING BLACK MATRIX FOR COLOR FILTER
Document Type and Number:
Japanese Patent JP2007310266
Kind Code:
A
Abstract:

To provide a method for forming a high quality pattern, in particular, a black matrix for a color filter, by which it is possible to easily perform cleaning and removing of decomposed matters or the like when ablation processing by laser beam is performed.

A thin film pattern 10 is formed by preforming a water-soluble polymer film 4 on the surface of a film 2 to be processed, provided on a substrate 1, then performing ablation processing by irradiating the surface of the polymer film 4 with laser beam 8 through a pattern mask 7, and removing resin decomposed matters 6 and remaining water-soluble polymer film 5 by washing. This method is suitable for forming the black matrix for the color filter. When this method is utilized for forming the black matrix, the film 2 to be processed is merely read in terms of a light-shielding resin film and the thin film pattern is merely read in terms of the black matrix.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
KEN HIKARIZAI
NODA MOTOO
FUJII YUKIO
Application Number:
JP2006141246A
Publication Date:
November 29, 2007
Filing Date:
May 22, 2006
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G02B5/20; G03F7/11; G03F7/36; H01J9/227
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto