To provide a method for manufacturing an optical multilayer filter with which troubles such as the occurrence of deformation of a substrate, peeling off of a film etc. caused by internal stress of a thin film is effectively avoided.
The method for manufacturing the optical multilayer filter includes: a step of forming one or more layers of inorganic thin films on the substrate 1; and a step of forming a viscoelastic buffer layer 2 which prevents transfer of the stress from the inorganic thin film to the substrate and which is composed of organic compounds between the lowermost layer of the inorganic thin film and the substrate, wherein a chemical vapor deposition (CVD) method is used in the step of forming the viscoelastic buffer layer 2. As the CVD method is used, a deposition rate of the viscoelastic buffer layer 2 is fast, and consequently the film with a practicable thickness is efficiently formed.
SHIBUYA MUNEHIRO
Kanji Nakayama
Tsuyoshi Ishizaki