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Title:
MODIFIED CARBON BLACK, PHOTOSENSITIVE BLACK RESIN COMPOSITION AND BLACK MATRIX RESIST COMPOSITION FOR COLORED FILTER
Document Type and Number:
Japanese Patent JP2002371204
Kind Code:
A
Abstract:

To provide a modified carbon black excellent in dispersability, light insulation property, and photosensitivity by a simple operation, a photosensitive black resin composition suitable for a black matrix resist for a colored filter capable of forming a black matrix of high dispersion stability, resolution, photosensitivity, and low reflectivity, a black matrix resist using the photosensitive black resin composition, and a black matrix using the black matrix resist.

This modified carbon black excellent in dispersion stability and having a radical-polymerizable group and its dispersion solution are obtained by treating a carbon black with a compound having an ethylenic unsaturated group and an isocyanato group in a molecule, and the above-mentioned purpose is dissolved using the modified carbon black.


Inventors:
KAMATA HIROTOSHI
OONISHI MINA
MUROFUSHI KATSUMI
Application Number:
JP2001182162A
Publication Date:
December 26, 2002
Filing Date:
June 15, 2001
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
G03F7/004; C08F2/38; C08F2/44; C08F2/50; C08F265/02; C08F292/00; C09C1/48; C09C1/56; C09D17/00; G02B5/00; G02B5/20; G02F1/1335; (IPC1-7): C09C1/56; C08F2/38; C08F2/44; C08F2/50; C08F265/02; C08F292/00; C09C1/48; C09D17/00; G02B5/00; G02B5/20; G02F1/1335; G03F7/004
Attorney, Agent or Firm:
Shinji Kakinuma