To provide a pattern drawing apparatus which uses a lamp as a light source and a micro-mirror device, in which it is not necessary to make ultraviolet light incident from an oblique side to the micro-mirror device, and in which an optical path of reflected ultraviolet light is not disturbed.
In a pattern drawing apparatus 100, ultraviolet light from a mercury lamp 101 is made incident to a polarization conversion optical system 103, and non-polarized light is converted into a linearly polarized S wave. The ultraviolet light is made incident to a polarization beam splitter 105 and reflected there approximately in 100%, moves up, passes through a 1/4 wavelength plate 106, becomes circularly polarized light and is made incident to a micro-mirror device 107. In ultraviolet light reflected on the micro-mirror device, ultraviolet light contributed to pattern exposure straightly moves down, passes through the 1/4 wavelength plate again to become a P wave, is transmitted through the polarization beam splitter approximately in 100%, and moves down. In ultraviolet light moving down, ultraviolet light contributed to pattern exposure passes through a pinhole plate 110 and reaches a substrate 114.
YANAGIDA KIMIO
SUGAWA SHIGETOSHI
TAKEHISA KIWAMU
| JP2005277209A | 2005-10-06 | |||
| JP2002365591A | 2002-12-18 | |||
| JP2003337426A | 2003-11-28 | |||
| JP2004101826A | 2004-04-02 |
| WO2005081034A1 | 2005-09-01 |