Title:
感光性組成物
Document Type and Number:
Japanese Patent JP2012510639
Kind Code:
A
Abstract:
The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1−O2C)—B—(CO2−A2+)x (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.
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Inventors:
Energy Edward W
Felix Nelson M
Patmanavan Munirasna
Chakra Pani Srinivasan
Felix Nelson M
Patmanavan Munirasna
Chakra Pani Srinivasan
Application Number:
JP2011538073A
Publication Date:
May 10, 2012
Filing Date:
December 01, 2009
Export Citation:
Assignee:
AZ Electronic Materials USA Corporation
International Classes:
G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Katsunori Uenishi
Ichiro Torayama
Blacksmith
Katsunori Uenishi
Ichiro Torayama