Title:
PLASMA PROCESSING APPARATUS, ABNORMAL OSCILLATION DETERMINATION METHOD, AND HIGH-FREQUENCY GENERATOR
Document Type and Number:
Japanese Patent JP2015022940
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To appropriately determine abnormal oscillation of a high-frequency oscillator.SOLUTION: A plasma processing apparatus according to one embodiment, comprises: a processing container; a plasma generation mechanism having a high-frequency oscillator and generating a plasma in the processing container by using a high frequency wave oscillated by the high-frequency oscillator; an impedance regulator regulating an impedance given to the high-frequency oscillator; and a determination part changing the impedance regulated by the impedance regulator, and determining abnormal oscillation of the high-frequency oscillator on the basis of a component at the central frequency of a fundamental wave that is a high frequency wave oscillated by the high-frequency oscillator in a state that the impedance is changed, and a component at peripheral frequencies existing at both ends of a predetermined frequency band using the central frequency of the fundamental wave as a center.
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Inventors:
KANEKO KAZUFUMI
FUNASAKI KAZUNORI
HASHIMOTO YUNOSUKE
FUNASAKI KAZUNORI
HASHIMOTO YUNOSUKE
Application Number:
JP2013151064A
Publication Date:
February 02, 2015
Filing Date:
July 19, 2013
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H05H1/46; H01L21/3065; H01L21/31
Attorney, Agent or Firm:
Hiroaki Sakai