Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2016119325
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a shower plate which inhibits deposition in a gas hole in a plasma processing apparatus which has the shower plate for introducing a gas into a processing container and generates surface wave plasma by micro-waves.SOLUTION: A plasma processing apparatus includes: a processing container 10 in which plasma treatment is performed; and a shower plate 100 which supplies a gas to the processing container 10. The plasma processing apparatus has a hanging member 101 protruding downward from a lower end surface of the shower plate 100. An outer surface of the hanging member 101 spreads to the outer side from an upper end part to a lower end part. The shower plate 100 includes: first supply ports 133 for supplying a first gas to the processing container 10; and second supply ports 151 for supplying a second gas. The first gas supply ports 133 are disposed at the inner side relative to the outer surface of the hanging member 101. The second gas supply ports 151 are disposed at the outer side relative to the outer surface of the hanging member 101.SELECTED DRAWING: Figure 4
Inventors:
IKEDA TARO
Application Number:
JP2014256294A
Publication Date:
June 30, 2016
Filing Date:
December 18, 2014
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; C23C16/455; C23C16/511; H05H1/46
Domestic Patent References:
| JP2015079735A | 2015-04-23 | |||
| JP2009302205A | 2009-12-24 | |||
| JPS622244U | 1987-01-08 |
Attorney, Agent or Firm:
Tetsuo Kanamoto
Miaki Kametani
Koji Hagiwara
Naoki Ogita
Miaki Kametani
Koji Hagiwara
Naoki Ogita