フルオロスルホンアミド基を含んだポリマーを含むポジ型フォトレジスト組成物およびその使用方法 - INTERNATIONAL BUSINESS MASCHINES CORPORATION

Title:

フルオロスルホンアミド基を含んだポリマーを含むポジ型フォトレジスト組成物およびその使用方法

Document Type and Number:

Japanese Patent JP4156599

Kind Code:

B2

Abstract:

A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.

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Inventors:

Wenchie Li
Pushkar Lao Varanas

Application Number:

JP2005000960A

Publication Date:

September 24, 2008

Filing Date:

January 05, 2005

Export Citation:

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