Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2003122010
Kind Code:
A
Abstract:
To provide a positive resist composition excellent in edge roughness and sensitivity.
The positive resist composition is characterized in containing a resin which has a specified aliphatic cyclic hydrocarbon group and which increases the solubility rate with an alkali developer liquid by the effect of an acid, a compound which generates an acid by radiation of active rays or radiation, and a compound which accelerates the solubility rate of the film with an alkali developer liquid.
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Inventors:
FUJIMORI TORU
Application Number:
JP2001318242A
Publication Date:
April 25, 2003
Filing Date:
October 16, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F220/18; C08F232/00; H01L21/027; (IPC1-7): G03F7/039; C08F220/18; C08F232/00; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)
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