Title:
PROCESS SIMULATOR, CVD EQUIPMENT USING THE SAME AND METHOD FOR PROCESS SIMULATION
Document Type and Number:
Japanese Patent JP2658840
Kind Code:
B2
Abstract:
PURPOSE: To enable execution of nonempirical simulation by a method wherein a reaction process is modeled by molecular orbital computation and simulation of a process of a chemical vapor growth is executed on the basis of the model.
CONSTITUTION: A simulator part 21 is equipped with a storage device 24 storing first and second vapor reaction process models and a film surface reaction process model which are so modeled by a nonempirical modeling method as to correspond to sets of first and second process conditions. Moreover, it is equipped with a reaction model setting device 212 which sets the first or second vapor reaction process model and the film surface reaction process model respectively so that they correspond to a supply of the set of the first or second process conditions. Moreover, it is equipped with a simulation part 213 including an optimum process condition determining means which compares first and second results of simulation corresponding to the first and second process conditions respectively with each other and selects the first process condition.
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Inventors:
YOKOZAWA AYUMI
Application Number:
JP30138393A
Publication Date:
September 30, 1997
Filing Date:
December 01, 1993
Export Citation:
Assignee:
NIPPON DENKI KK
International Classes:
C23C14/34; C23F4/00; G06F17/50; G06F19/00; G06Q50/00; G06Q50/04; H01L21/00; H01L21/205; H01L21/283; H01L21/31; H01L21/334; (IPC1-7): H01L21/31; C23C14/34; C23F4/00; G06F17/00; H01L21/00; H01L21/205
Other References:
応用物理 Ｖｏｌ．６０ Ｎｏ．１１（１９９１）ｐ．１１３１−１１３５
応用物理 Ｖｏｌ．６２ Ｎｏ．１１（１９９３）ｐ．１０７６−１０８７
応用物理 Ｖｏｌ．６２ Ｎｏ．１１（１９９３）ｐ．１０７６−１０８７
Attorney, Agent or Firm:
京本 直樹 （外２名）