RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023179380

Kind Code:

A

Abstract:

To provide a resist composition which enables manufacture of a resist pattern having good CD uniformity.SOLUTION: A resist composition contains a compound represented by formula (I), and an acid generator, (wherein, R2 represents an acid-labile group; m1 represents 1 or 2; m2 represents any one integer of 1 to 5; when m2 is 2 or more, a plurality of R2 may be the same or different; R3 represents a halogen atom, a hydroxy group, an alkyl group, and an alkoxy group, and the like; m3 represents any one integer of 0 to 4; and when m3 is 2 or more, a plurality of R3 may be the same or different, provided that 2≤m1+m2+m3≤6.)SELECTED DRAWING: None

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Inventors:

KITA YUJI
ICHIKAWA KOJI

Application Number:

JP2023092156A

Publication Date:

December 19, 2023

Filing Date:

June 05, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/038; C07C65/21; G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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