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Title:
SALT, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2014177449
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having a good circular hole shape can be produced.SOLUTION: The resist composition comprises a salt expressed by formula (B2), an acid generator that generates sulfonic acid by exposure, and a resin having an acid-labile group. In the formula B2, Lrepresents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms which may have a substituent; Xrepresents -CO-O-, -O-CO-, or -O-; Lrepresents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms; Rrepresents an alicyclic hydrocarbon group having 3 to 36 carbon atoms which may have a substituent, or an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent; and Zrepresents an organic cation.

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Inventors:
SAKAMOTO HIROSHI
MUKAI YUICHI
ICHIKAWA KOJI
Application Number:
JP2014009206A
Publication Date:
September 25, 2014
Filing Date:
January 22, 2014
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C381/12; C07C69/34; C07C69/40; C07C309/17; C07D305/06; C07D327/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2009244805A2009-10-22
JPS53141240A1978-12-08
JPS53113033A1978-10-03
JPS5645461A1981-04-25
JPS62132849A1987-06-16
JPS6483058A1989-03-28
JPH01250398A1989-10-05
JPH11509548A1999-08-24
JP2013125146A2013-06-24
JP2002122994A2002-04-26
JP2013250433A2013-12-12
JP2014071305A2014-04-21
JP2013250431A2013-12-12
JP2003280202A2003-10-02
JP2005070316A2005-03-17
JP2010285446A2010-12-24
JP2009161479A2009-07-23
JPH06501692A1994-02-24
JPS5395919A1978-08-22
JP2012173419A2012-09-10
JP2012048187A2012-03-08
Foreign References:
WO1996024617A11996-08-15
WO2011105628A12011-09-01
US3592836A1971-07-13
Attorney, Agent or Firm:
Nakayama δΊ¨
Toru Sakamoto



 
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