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Title:
SENSOR FOR SCANNING PROBE MICROSCOPE, AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2006170979
Kind Code:
A
Abstract:

To provide a sensor for a scanning probe microscope, and its manufacturing method.

This sensor for the scanning probe microscope includes a cantilever 3, a holding member 2, a sensor tip 4 provided with an electron beam deposition type (called as EBD hereinafter) probe tip 5, each end part of the cantilever 3 is formed with the holding member 2, and the sensor tip 4, the EBD probe tip 5 is fixed directly to a base part of the sensor tip 4, and the EBD probe tip 5 is fixed engaged with a hole 6 formed by removing one part of the base part of the sensor tip 4. This manufacturing method therefor includes an etching process by photolithography, or a process for forming the EBD probe tip 5 in the hole 6 of the sensor tip 4 by corpuscular beam deposition, after removing a material by irradiation of a corpuscular beam.


Inventors:
KRAUSE OLIVER
LEHRER CHRISTOPH
PETERSEN SILKE
Application Number:
JP2005334218A
Publication Date:
June 29, 2006
Filing Date:
November 18, 2005
Export Citation:
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Assignee:
NANOWORLD AG
International Classes:
B82B1/00; B82B3/00; G01Q70/12; G01Q70/16
Attorney, Agent or Firm:
Hiroyuki Niwa