To provide a sensor for a scanning probe microscope, and its manufacturing method.
This sensor for the scanning probe microscope includes a cantilever 3, a holding member 2, a sensor tip 4 provided with an electron beam deposition type (called as EBD hereinafter) probe tip 5, each end part of the cantilever 3 is formed with the holding member 2, and the sensor tip 4, the EBD probe tip 5 is fixed directly to a base part of the sensor tip 4, and the EBD probe tip 5 is fixed engaged with a hole 6 formed by removing one part of the base part of the sensor tip 4. This manufacturing method therefor includes an etching process by photolithography, or a process for forming the EBD probe tip 5 in the hole 6 of the sensor tip 4 by corpuscular beam deposition, after removing a material by irradiation of a corpuscular beam.
JP2008072727 | MAGNETIC LOGIC ELEMENT |
JPH07160050 | TONER FOR ELECTROSTATIC CHARGING IMAGE DEVELOPMENT |
WO/2008/150005 | IROX NANOWIRE NEURAL SENSOR |
LEHRER CHRISTOPH
PETERSEN SILKE