Title:
SUBMERGED PLASMA GENERATING METHOD, SUBMERGED PLASMA GENERATING DEVICE, PROCESSED LIQUID PURIFYING DEVICE, AND ION CONTAINING LIQUID CREATING DEVICE
Document Type and Number:
Japanese Patent JP2013211204
Kind Code:
A
Abstract:
To provide a submerged plasma generating method, a submerged plasma generating device, a processed liquid purifying device, and an ion containing liquid creating device which highly efficiently create submerged plasma.
A porous dielectric 2 having numerous continuous holes 24 is provided. A mixed liquid containing a liquid or an operation gas is supplied from a conductivity introduction part 14 to the continuous holes 24 of the porous dielectric 2, and a voltage is applied to the porous dielectric 2 to generate electric discharge within the numerous continuous holes 24. Thus, plasma generates within the numerous continuous holes 24 to create liquid derived plasma and/or operation gas derived plasma.
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Inventors:
SHIRAFUJI RITSU
TAKAI OSAMU
SAITO NAGAHIRO
NISHIMURA YOSHIMI
HORIBE HIROSHI
SUGIHARA MASAHIKO
KAKITANI SHINICHI
ARAKI MANABU
TAKAI OSAMU
SAITO NAGAHIRO
NISHIMURA YOSHIMI
HORIBE HIROSHI
SUGIHARA MASAHIKO
KAKITANI SHINICHI
ARAKI MANABU
Application Number:
JP2012081750A
Publication Date:
October 10, 2013
Filing Date:
March 30, 2012
Export Citation:
Assignee:
UNIV OSAKA CITY
UNIV NAGOYA
KURITA SEISAKUSHO KK
UNIV NAGOYA
KURITA SEISAKUSHO KK
International Classes:
H05H1/24; C02F1/48
Domestic Patent References:
| JP2004268003A | 2004-09-30 | |||
| JP2004245465A | 2004-09-02 | |||
| JP2000140624A | 2000-05-23 | |||
| JPS6446046U | 1989-03-22 | |||
| JPH0974086A | 1997-03-18 | |||
| JP2007207540A | 2007-08-16 | |||
| JP2004268003A | 2004-09-30 |
Attorney, Agent or Firm:
Hisami Miki