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Title:
THERMOCHEMICAL VAPOR PHASE VAPOR DEPOSITION APPARATUS AND LOW-TEMPERATURE SYNTHESIS OF CARBON NANOTUBE USING THE SAME
Document Type and Number:
Japanese Patent JP2001032071
Kind Code:
A
Abstract:

To provide a low-temperature thermochemical vapor phase vapor deposition apparatus and a low-temperature synthesis method for a carbon nanotube using the same.

This thermochemical vapor phase vapor deposition apparatus includes a reaction tube 10 which has a gas inlet 12 and an air exit 14 and includes a first region for pyrolyzing the gas supplied from the gas inlet 12 adjacently to the gas inlet 12 side and a second region for synthesizing the carbon nanotube by using the gas pyrolyzed in the first region adjacently to the air exit 14 side, a first resistance heating element 24 which is disposed on the outer periphery of the reaction tube 10 and is used to maintain the first region at a first temperature, a second resistance heating element 26 which is disposed on the outer periphery of the reaction tube 10 and is used to maintain the second region at a second temperature lower then the first temperature and a thennally insulating material 22 which is disposed between the first resistance heating element 24 and the second resistance heating element 26 and is used to thermally insulate these materials. The carbon nanotube is synthesized on catalyst particulates by using a gaseous carbon source decomposed in the second region kept at the temperature lower than the temperature of the first region.


Inventors:
LEE CHEOL JIN
YOO JAE-EUN
Application Number:
JP2000179984A
Publication Date:
February 06, 2001
Filing Date:
June 15, 2000
Export Citation:
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Assignee:
LEE CHEOL JIN
ILJIN NANOTECH CO LTD
International Classes:
B01J23/26; B01J23/44; B01J23/74; B01J23/755; B01J37/02; B01J38/08; C01B31/02; B82B3/00; C23C16/26; C23C16/458; H01J9/02; (IPC1-7): C23C16/26; B01J23/26; B01J23/44; B01J23/74; B82B3/00; C01B31/02
Attorney, Agent or Firm:
Hattori Masaki