A composition for forming a passivation film, a semiconductor substrate with a passivation film and a method for manufacturing the same, and a solar cell element and a method for manufacturing the same.

Title:

Document Type and Number:

Japanese Patent JP6334919

Kind Code:

B2

Abstract:

The invention provides a composition for forming a passivation film, including: an organic aluminum compound represented by General Formula (I); and a resin, wherein R1's each independently represent an alkyl group having 1 to 8 carbon atoms; n represents an integer of from 0 to 3; X2 and X3 each independently represent an oxygen atom or a methylene group; R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.

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Inventors:

Toru Tanaka
Akihiro Oda
Tsuyoshi Nojiri
Masato Yoshida

Application Number:

JP2013552431A

Publication Date:

May 30, 2018

Filing Date:

December 28, 2012

Export Citation:

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Assignee:

Hitachi Chemical Co., Ltd.

International Classes:

H01L21/316; C08K5/10; C08K5/56; C08L101/00; H01L21/312; H01L31/0216

Domestic Patent References:

JP2008010746A
JP2011216845A
JP51033567A
JP2000319530A
JP2011233875A
JP8225382A
JP2002154184A
JP2004006565A
JP2006279019A
JP2010171263A
JP4767110B1
JP2008138159A
JP6125103A

Attorney, Agent or Firm:

Patent Service Corporation Taiyo International Patent Office

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