Title:
CHAMBER TRANSFER APPARATUS AND ATOMIC LAYER DEPOSITION APPARATUS COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2024/034790
Kind Code:
A1
Abstract:
A chamber transfer apparatus, according to one embodiment of the present invention, is a movable chamber transfer apparatus for receiving a chamber from an external apparatus or transferring the chamber to the external apparatus, the movable chamber transfer apparatus comprising: a base frame; and one or more chamber supports disposed on the base frame and extending in a first direction. One or more of the chamber supports are provided so that the quantity thereof is the same as the quantity of chambers, and the chamber supports directly support the chambers and comprise guide rails including a first guide rail, and a second guide rail arranged in parallel to the first guide rail by being spaced apart from the first guide rail in a second direction intersecting the first direction, wherein the first guide rail and the second guide rail comprise one or more transfer rollers making contact with the chambers.
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Inventors:
CHOI KWANG HYUN (KR)
KIM HYUN WOO (KR)
KWAK NO WON (KR)
SEO JEONG HO (KR)
KANG BYUNG JU (KR)
KIM HYUN WOO (KR)
KWAK NO WON (KR)
SEO JEONG HO (KR)
KANG BYUNG JU (KR)
Application Number:
PCT/KR2023/006846
Publication Date:
February 15, 2024
Filing Date:
May 19, 2023
Export Citation:
Assignee:
HANWHA CORP (KR)
International Classes:
H01L21/677; C23C16/455
Foreign References:
| KR20200068220A | 2020-06-15 | |||
| JP2009298223A | 2009-12-24 | |||
| KR20150087915A | 2015-07-31 | |||
| KR20140114931A | 2014-09-30 | |||
| KR20080065348A | 2008-07-14 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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